Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

• Emre Gürdal,
• Simon Dickreuter,
• Fatima Noureddine,
• Pascal Bieschke,
• Dieter P. Kern and
• Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

• substrate. Exposing them to an aqueous environment promotes a morphological change of the spherical micelles [18]. In the next step, the micelles are treated with UV irradiation, which causes the gold salt particles in the center to grow bigger by photochemical growth [18]. To enlarge the metal precursor

Nanoporous silicon nitride-based membranes of controlled pore size, shape and areal density: Fabrication as well as electrophoretic and molecular filtering characterization

• Axel Seidenstücker,
• Stefan Beirle,
• Fabian Enderle,
• Paul Ziemann,
• Othmar Marti and
• Alfred Plettl

Beilstein J. Nanotechnol. 2018, 9, 1390–1398, doi:10.3762/bjnano.9.131

• substrates [38][39]. However, this approach often does not meet the enhanced requirements on the perfection of the spherical shape and the narrowness of the size distribution of metallic NPs. Hence, we prefer a selective photochemical growth technique of an additional Au shell of homogeneous thickness on top

• self-organization of Au-loaded diblock copolymer micelles followed by plasma treatments. (b) Applying a photochemical growth process the Au NP size can be enlarged in a controlled way. (c) The resulting NP mask is exploited to etch nanopillars by RIE, (d) a Cr layer (black) is evaporated, (e) and the

Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

• Burcin Özdemir,
• Axel Seidenstücker,
• Alfred Plettl and
• Paul Ziemann

Beilstein J. Nanotechnol. 2013, 4, 886–894, doi:10.3762/bjnano.4.100

• silicon nitride. Keywords: Au nanoparticles; block copolymer micellar lithography; photochemical growth; reactive ion etching; self-assembly; Introduction Nanoparticles (NP), though primarily sought-after because of their new size- and shape-dependent physical or chemical properties, also play an

• NP are exposed to a RIE process short enough that erosion of the NP can be neglected. As a result, one obtains correspondingly short nanopillars that are still capped by Au NP. Subsequent photochemical growth combined with a cleaning and annealing step delivers enlarged Au caps, which serve as masks

• : repeated OTMS stabilization and photochemical growth of nanomasks combined with a single etching step a single stabilization step followed by cyclic etching and re-growth of the photochemical mask In silica the first method appears to be more suitable for preparing sub-30 nm sized pillars with an aspect